Introduction
Bimonthly, started in 1957
Administrator
Shanxi Provincial Education Department
Sponsor
Taiyuan University of Technology
Publisher
Ed. Office of Journal of TYUT
Editor-in-Chief
SUN Hongbin
ISSN: 1007-9432
CN: 14-1220/N
Administrator
Shanxi Provincial Education Department
Sponsor
Taiyuan University of Technology
Publisher
Ed. Office of Journal of TYUT
Editor-in-Chief
SUN Hongbin
ISSN: 1007-9432
CN: 14-1220/N
location: home > paper >
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Photodegradation of Phosphorylacetic Acid Under Ultraviolet Light Irradiation
DOI:
10.16355/j.cnki.issn1007-9432tyut.2019.02.008
Received:
Accepted:
| Corresponding author | Institute | |
| DU Bin | Geological Exploration and Research Institute,China National Administration of Coal Geology,Beijing 100039,China |
abstract:
In order to understand the influence of the light source,the initial concentration and pH of solution in the photolysis process of phosphorylacetic acid,the phosphate released from phosphorylacetic acid degradation was investigated under UV irradiation.Results show that the photodegradation process of phosphorylacetic acid includes direct photolysis and self-sensitized photolysis involving ·OH and 1O2.The increase of ultraviolet radiation intensity is conducive to removal of phosphorylacetic acid,0.1 mmole/L phosphorylacetic acid solution is completely degraded under 1000 W high pressure mercury lamp irradiation within 150 min,the degradation rate is 0.0165 min^-1.The half-life of the photolysis is 42 min.As the initial concentration and the initial pH value of the solution increases,the reaction rate of phosphorylacetic acid shows a decreasing trend.Both NH4^+ and NO3^-have inhibitory effects on phosphorylacetic acid photolysis.
Keywords:
phosphorylacetic acid;photodegradation;reactive oxygen species